Dichlorosilylene: rate constant for reaction with oxygenSANDHU, V; JODHAN, A; SAFARIK, I et al.Chemical physics letters. 1987, Vol 135, Num 3, pp 260-262, issn 0009-2614Article

Absolute rate constants for the reaction of silylene with hydrogen, silane, and dislaneJASINSKI, J. M; CHU, J. O.The Journal of chemical physics. 1988, Vol 88, Num 3, pp 1678-1687, issn 0021-9606Article

Dichlorosilylene: rate constant for the gas-phase reaction with nitric oxideSANDHU, V; SAFARIK, I; STRAUSZ, O. P et al.Reviews of chemical intermediates. 1989, Vol 11, Num 1, pp 19-24, issn 0162-7546Article

Role of the trichlorosilyl radical and dichlorosilylene in gas-phase reactions of trichlorosilaneHEINICKE, J; GEHRHUS, B.Journal of analytical and applied pyrolysis. 1994, Vol 28, Num 1, pp 81-92, issn 0165-2370Article

Kinetics of the reaction of silylene with hydrogen and a possible resolution of discrepancies over △H_f^○-(SiH₂)FREY, H. M; WALSH, R; WATTS, I. M et al.Journal of the Chemical Society. Chemical communications. 1986, Num 15, pp 1189-1191, issn 0022-4936Article

Absolute rate constants for silylene reactions with diatomic moleculesCHU, J. O; BEACH, D. B; ESTES, R. D et al.Chemical physics letters. 1987, Vol 143, Num 2, pp 135-139, issn 0009-2614Article

Reaction of silicon difluoride with halogens: a reinvestigationSURESH, B. S; THOMPSON, J. C.Journal of the Chemical Society. Dalton transactions. 1987, Num 5, pp 1123-1126, issn 0300-9246Article

Gas phase reactions of SiF₂ with F₂ and Cl₂STANTON, A. C; FREEDMAN, A; WORMHOUDT, J et al.Chemical physics letters. 1985, Vol 122, Num 3, pp 190-195, issn 0009-2614Article

The equilibrium geometry of HNSiBOTSCHWINA, P; TOMMEK, M; SEBALD, P et al.The Journal of chemical physics. 1991, Vol 95, Num 10, pp 7769-7770, issn 0021-9606Article

REMPI/MS detection of SiF₂ radicals by (3+1) and (1+3) photoionizationHORWITZ, J. S; DULCEY, C. S; LIN, M. C et al.Chemical physics letters. 1988, Vol 150, Num 1-2, pp 165-170, issn 0009-2614Article

Wide fluctuations in fluorescence lifetimes of individual rovibronic levels in SiH₂ (ùB₁)THOMAN, J. W. JR; STEINFELD, J. I; MCKAY, R. I et al.The Journal of chemical physics. 1987, Vol 86, Num 11, pp 5909-5917, issn 0021-9606Article

Information theoretic analysis of quantal fluctuations in fluorescence lifetimesENGEL, Y. M; LEVINE, R. D; THOMAN, J. W. JR et al.Journal of physical chemistry (1952). 1988, Vol 92, Num 19, pp 5497-5500, issn 0022-3654Article

Quantal fluctuations in fluorescence lifetimes of individual rovibronic levelsENGEL, Y. M; LEVINE, R. D; THOMAN, J. W. JR et al.The Journal of chemical physics. 1987, Vol 86, Num 11, pp 6561-6563, issn 0021-9606Article

Microwave spectroscopic detection of dichlorosilylene SiCl₂ in the ground stateTANIMOTO, M; TAKEO, H; MATSUMURA, C et al.The Journal of chemical physics. 1989, Vol 91, Num 4, pp 2102-2107, issn 0021-9606Article

Atomic properties and the reactivity of carbenesMACDOUGALL, P. J; BADER, R. F. W.Canadian journal of chemistry (Print). 1986, Vol 64, Num 8, pp 1496-1508, issn 0008-4042Article

Dynamic stability of silacarbonyl ylideTACHIBANA, A; FUENO, H; OKAZAKI, I et al.International journal of quantum chemistry. 1992, Vol 42, Num 4, pp 929-939, issn 0020-7608Article

Unimolecular dissociation dynamics of disilaneAGRAWAL, P. M; THOMPSON, S. L; RAFF, L. M et al.The Journal of chemical physics. 1990, Vol 92, Num 2, pp 1069-1082, issn 0021-9606Article

Production of Si(¹D₂) from electronically excited SiH₂VAN ZOEREN, C. M; THOMAN, J. W. JR; STEINFELD, J. I et al.Journal of physical chemistry (1952). 1988, Vol 92, Num 1, pp 9-11, issn 0022-3654Article

Effect of electron correlation on the topological properties of molecular charge distributionsGATTI, C; MACDOUGALL, P. J; BADER, R. F. W et al.The Journal of chemical physics. 1988, Vol 88, Num 6, pp 3792-3804, issn 0021-9606Article

Trajectory studies of unimolecular reactions of Si₂H₄ and SiH₂ on a global potential surface fitted to ab initio and experimental dataAGRAWAL, P. M; THOMPSON, D. L; RAFF, L. M et al.The Journal of chemical physics. 1988, Vol 89, Num 2, pp 741-750, issn 0021-9606Article

Mechanism and energetics of dimerization of SiH₂ radicals on H-terminated Si(001)-(2 x 1) surfacesSRIRAMAN, Saravanapriyan; MAHALINGAM, Pushpa; AYDIL, Eray S et al.Surface science. 2003, Vol 540, Num 2-3, pp L623-L630, issn 0039-6028Article

Reactions of SiCl₂ with N₂O, NO and O₂GOLDBERG, Nicola; OGDEN, J. Steven; ALMOND, Matthew J et al.PCCP. Physical chemistry chemical physics (Print). 2003, Vol 5, Num 24, pp 5371-5377, issn 1463-9076, 7 p.Article

Spin-orbit coupling constants from coupled-cluster response theoryCHRISTIANSEN, O; GAUSS, J; SCHIMMELPFENNIG, B et al.PCCP. Physical chemistry chemical physics (Print). 2000, Vol 2, Num 5, pp 965-971, issn 1463-9076Article

Coupled-cluster, unitary coupled-cluster and MBPT(4) open-shell analytical gradient methodsWATTS, J. D; TRUCKS, G. W; BARTLETT, R. J et al.Chemical physics letters. 1989, Vol 164, Num 5, pp 502-508, issn 0009-2614Article

Detection of the silylene ν band by infrared diode laser kinetic spectroscopyYAMADA, C; KANAMORI, H; HIROTA, E et al.The Journal of chemical physics. 1989, Vol 91, Num 8, pp 4582-4586, issn 0021-9606Article